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JEDEC and CXL Consortium Officially Announce Collaboration

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Update time : 2022-08-31 11:04:12
        The JEDEC Solid State Technology Association and the Compute Express Link (CXL) Alliance recently announced the signing of a Memorandum of Cooperation to advance persistent memory technology.
        The Memorandum of Cooperation between JEDEC and the CXL Consortium will establish a framework for ongoing communication to coordinate future efforts between the two organizations," said Siamak Tavallaei, President of the CXL Consortium. The joint working group will collaborate on form factor, management, security, and useful solutions for DRAM and other memory technologies."
        JEDEC Chairman Mian Quddus said "With the support of dozens of industry-leading companies, this collaboration will help both organizations optimize the development of our respective standards and will support JEDEC's current focus on creating select standards for CXL-connected memory modules and components."
        According to the information, CXL is an open standard for high-speed CPU to-device and CPU-to-memory connectivity for processors, memory extensions and gas pedals that simplifies interconnection and scalability of gas pedals and memory extensions.The CXL Consortium is dedicated to advancing CXL technology, with founding members including Intel, Alibaba, Huawei, Cisco, Facebook, Google, HP and Microsoft and others. In recent years the CXL Consortium has merged with the Gen-Z Consortium and has also expanded to more than 165 members, covering nearly all major CPU, GPU, memory, storage and networking device manufacturers.
        In August this year JEDEC released the latest JESD220F, the UFS4.0 standard. 2020 JEDEC announced the DDR5 memory standard (JESD79-5 DDR5 SDRAM) and in October 2021 JEDEC announced an upgrade to the standard with JESD79-5A DDR5 SDRAM. the industry believes that because of CXL and The industry believes that this collaboration between CXL and JEDEC will help drive further development in the memory industry due to their extensive influence in their respective fields.

 
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