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ASML/TSMC 2nm has been confirmed! NVIDIA makes a big leap in chip lithography technology: 40 times faster

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Update time : 2023-03-24 11:40:53
        On March 21st, NVIDIA Spring GTC Technology Conference was held. As the main stage of NVIDIA's dazzling technology, the new things can be said to be dazzling. One notable one is NVIDIA 's announcement of the cuLitho software acceleration library, which can speed up lithography calculation time by 40 times.
 
 
        The so-called computational lithography is the technology of making a photomask for chip production. The mask is a planar transparent or translucent optical element with a pattern required for chip processing, and the pattern is transferred to the photoresist layer according to whether exposure is required. After the lithography process starts, by controlling the exposure and switching operation of the lithography machine, the beam of light can be divided and positioned according to the pattern on the mask, so that the beam of light only irradiates the area that needs to be exposed, thereby transferring the pattern on the chip to the photoresist layer to implement chip lithography.
        Because each chip undergoes multiple exposures, the number of masks used in lithography varies. The NVIDIA H100 (TSMC 4N process, 80 billion transistor) requires 89 masks, and Intel's 14nm CPU requires more than 50 masks.
        Previously, "refined" computing lithography relied on clusters of CPU servers. Now NVIDIA says that 500 DGX H100 sets (including 4000 Hopper GPUs) can do the same amount of work as 40,000 CPU computing servers, but 40 times faster and 9 times less power consumption. This means that when the GPU is accelerated, the computational lithography time to produce photomasks can be reduced from a few weeks to eight hours.
Huang Renxun revealed that NVIDIA has signed technical cooperation with ASML (Asma, Netherlands), TSMC and Synopsys, and Synopsys has even integrated the technology into its EDA tools, which will serve 2nm and even higher precision processes.
        NVIDIA believes that the new technology can achieve higher chip density and yield, follow better design rules, and use artificial intelligence to drive the lithography industry forward.
        According to NVIDIA, after the application of high NA EUV lithography machines in the next few years, the amount of computational data for mask production will increase by more than 10 times. Currently, cuLitho software acceleration library already supports curved masks and subatomic photoresist masks that can be used in high NA EUV lithography. Manufacture.
 

 
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