Micron Announces Successful Bypass of EUV Lithography and Readiness for Mass Production
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Update time : 2022-11-05 10:29:19
U.S. memory chip maker Micron Technology Inc. said Tuesday it has started to offer samples of its latest DRAM chips to smartphone makers for testing.
Micron is using a new generation of cutting-edge manufacturing technology, 1-beta, on its low-power LPDDR5X mobile memory, enabling it to reach a maximum rate of 8.5Gb.
Micron currently mass produces LPDDR5X chips based on 1-alpha technology, and according to Micron, 1-beta chips offer a 15 percent improvement in energy efficiency over 1-alpha and a 35 percent increase in memory density. The improved energy efficiency means the chips can free up capacity for more powerful processors, thereby extending battery life. The increased memory density means customers can put more data into a more compact space, freeing up space for further performance improvements. In addition, Micron executive Scott DeBoer said that 1-beta technology, enabled by Micron's proprietary multi-exposure lithography combined with leading-edge processes and advanced materials, is another leap forward in memory innovation. 1-beta GRAM process technology delivers unprecedented memory density, setting the stage for a new generation of data-intensive, intelligent and low-power technology revolution. And with its proprietary multi-exposure lithography, Micron has successfully bypassed the extreme ultraviolet (EUV) lithography that other chip companies must use.
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